Dr Ralf Bandorf
Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig (DE)
„Gas-Flow Sputtering – a flow regime dominated sputtering process for films up to several ten microns”
Dr Carsten Bundesmann,
Leibniz-Institut für Oberflächenmodifizierung (IOM), Leipzig (DE)
„Ion Beam Sputter Deposition: Fundamentals and Applications”
Prof. Jon Tomas Guðmundsson
University of Iceland, Reykjavík (IS)
„On electron heating, deposition rate and ion recycling in the High Power Impulse Magnetron Sputtering discharge”
Prof. Holger Kersten
Kiel University (DE)
„Non-conventional probe diagnostics for plasma processing”
Dr Wojciech Koczorowski,
Poznań University of Technology, Faculty of Materials Engineering and Technical Physics, Institute of Physics, Poznań (PL)
„Application of layered materials in simple microelectronics”